University of Bern

Institute of Applied Physics

Publications

Details of Publication IAP ID 4297

Type:Articles in Journals
IAP ID:4297
Authors:Marc A. Nicolet, Manuel Ryser, Valerio Romano,
Title:Electrical resistivity change in amorphous Ta42Si13N45 films by stress relaxation
Journal:Applied Physics A
Volume:118
Number:3
Pages:1153-1160
doi:10.1007/s00339-014-8931-0
Year:2015
Status:published
pdf:[0.98 MB]

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