University of Bern

Institute of Applied Physics

Publications

Details of Publication IAP ID 4130

Type:Articles in Journals
IAP ID:4130
Authors:Jürg Balmer, Davide Bleiner, Felix Staub
Title:Extreme ultraviolet lasers: principles and potentials for next generation lithography
Journal:J. Micro/Nano Lithography MEMS MOEMS
Editor:SPIE Digital Library
Volume:11
Number:2
Pages:021119
doi:10.1117/1.JMM.11.2.021119
Year:2012
Status:published

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